Microsystems Technology

Dual-Layer EpiPolySilicon Process

Recently, Fraunhofer ISIT has developed an innovative process technology for the manufacturing of sophisticated MEMS scanners (²ε Process). Following the success of the well established surface micromachining technology PSM-X2 for inertial sensors, the ²ε process is based on structuring two 30 microns thick epitactically grown polysilicon layers. This allows the realisation of staggered finger combdrives for mirror actuation and detection and the design of suspension