Fraunhofer-Institut für Siliziumtechnologie

Fraunhofer-Institut für Siliziumtechnologie

Wet 13

Presentations of the 13th Wet Users Group Meeting 2021

0-1 - Agenda_Introduction_WET.pdf [ PDF 0,86 MB ]
0-2 - List of participants.pdf [ PDF 0,11 MB ]
1-1 - tepcon - Christoph Kluge - THE DIGITAL TRANSFORMATION FROM ESALES TO ESERVICE.pdf [ PDF 3,27 MB ]
1-2 - AP-S - Stefan Zuercher - From Metal Lift-off to Metal Etch - from Singlewafer to Batch application.pdf [ PDF 1,33 MB ]
1-3 - AMAT - Imge Namal - Raider Next Gen Process Capabilities.pdf [ PDF 1,35 MB ]
1-4 - NexGen - Benedikt Risse - Increased Process Stability for Selective Si P+_P- Etching.pdf [ PDF 0,78 MB ]
2-1 - Technic - Jerome Daviot - Wet Processes -An endless renewal of challenges.pdf [ PDF 2,16 MB ]
2-2 - APET - John Oshinowo - Stable Oxide-Free Silicon Wafer Surface with Optimized Si-H Terminations using a Novel HF-Last Wet Clean Technology.pdf [ PDF 3,3 MB ]
2-3 - Pall - Jochen Ruth - Why to replace a filter - Lifetime limitations and replacement criteria.pdf [ PDF 4,81 MB ]
2-4 - Entegis - Siddart Sampath - Removal of Trace Metals from Ultra Pure Water (UPW) using Membrane-based Solutions.pdf [ PDF 1,78 MB ]
2-5 - Trebor - Nick Rose - Quantum NXT.pdf [ PDF 2,11 MB ]