Fraunhofer Institute for Silicon Technology
© Fraunhofer ISIT / photocompany, Itzehoe
Process Technology
Tabbed contents
Our solution
ISIT operates a state-of-the-art front-end semiconductor production line for 200 mm Si wafers in collaboration with Vishay Semiconductor Itzehoe GmbH.
- Vishay uses the line for the series production of power components (PowerMOS and IGBT).
- ISIT uses the same line for demanding development projects
Technology
- Front-end production technology for 200 mm Si wafers
- Processing of ultra-thin substrates (< 50 µm)
- Dopant activation using laser activation
- Back-end processes: new metallization processes for advanced assembly techniques
- MEMS clean room with virtual tour
Applications
- Series production of PowerMOS and IGBT power components in cooperation with Vishay
- Front-end development projects: process optimization, materials research, and technology development
- Back-end refinement for complex assembly techniques
Benefits
- Development and production at a single location, 24/7
- Wide range of state-of-the-art semiconductor processes from a single source
- Access to ultra-thin substrates and innovative laser activation
- State-of-the-art metallization technologies for the most demanding requirements
- Virtual cleanroom tour for fast project planning