Processes on Wafer-Level

Fraunhofer ISIT is one of Europe’s most modern research facilities for microsystem technology with two state-of-the-art cleanrooms for development, pilot production, and industrial fabrication of MEMS, MOEMS and PowerMOS devices.

Fraunhofer ISIT offers complete process chains as well as individual processes ranging from wafer start to endtest and further backend processing. Especially, processes located in the MEMS cleanroom, may be applied on preprocessed 200mm MEMS or CMOS wafers of the customer. Last but not least custom specific processes can be transferred to the location of the customer.