Brief Portrait

Research Fab Microelectronics Germany#

To reinforce the position of Europe’s semiconductor and electronics industry within global competition, eleven institutes within the Fraunhofer Group for Microelectronics - including the Fraunhofer ISIT - have, together with the Leibniz Institute for Innovations for High Performance Microelectronics (IHP) and the Ferdinand-Braun-Institut, Leibniz-Institut für Höchstfrequenztechnik (FBH), come up with a concept for a cross-location research factory for microelectronics and nanoelectronics. In spring 2017, this new organization got off the ground.
The concept for the research fab was designed jointly by Fraunhofer and Leibniz to combine their competences in a pool for technologies. For the modernization and extension of their equipment the 13 research facilities receive around 350 million euros from the Federal Ministry of Education and Research.

The investments for the Fraunhofer ISIT amounting to 19.3 million euros serve to modernize and expand the cleanroom equipment with a focus on power electronics and novel sensor systems.

In power electronics, ISIT will provide facilities for the development of gallium nitride as a new material base for innovative power devices that did not previously exist at the institute. New systems are also being purchased for the development of sensors and actuators, for example equipment for applying piezoelectric and magnetic materials to silicon, vapor deposition systems for special optical and infra-red coatings and furnace systems in which glass wafers can be viscously shaped specifically.

With this new equipment park, ISIT can offer forward-looking manufacturing processes to the industry and is able to develop novel components and convert them into production.