Chemical-mechanical Polishing (CMP)

Announcements:

Next Meetings:

- CMP and WET Users' Group Meeting 11/2022

The next European CMP and WET users group meeting will be held in Amsterdam on November 10-11, 2022. The meeting will be held in-person, so far we do not consider any hybrid formats. Once we secured the event venue with support of our partner SPS Europe, more details will follow.“

Sponsors who want to support us are very welcome.

For further information please contact benjamin.steible@isit.fraunhofer.de or knut.gottfried@enas.fraunhofer.de.

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ICPT 2022 - International Conference on Planarization Technology

The International Conference on Planarization Technology (ICPT) will be held at the Benson Hotel located in Portland, Oregon, September 27-29, 2022. In-person for 1st time in 3 years or Virtual for those unable to travel to Portland.

More Info

 

CMP & WET Users' Meetings

© Fraunhofer ISIT/Eric Shambroom Photography 2020
© Fraunhofer ISIT/Eric Shambroom Photography 2020

The German VDE/VDI-GMM Society for Microelectronics, Micro and Precision Engineering supports developments in microelectronics and microsystem technology and organizes together with ISIT regular CMP users meetings. Target groups are all individuals who employ CMP and use it for production, who manufacture equipment and materials for CMP or who are active in CMP-related R&D.

Since 1998 the CMP Users Meetings are held in regular intervals. The fall meetings are organized in timely connection with Semicon Europa and have developed into an international event. The spring meetings take place at changing locations and are intended as a European forum for CMP information exchange.The conference language of the meeting is English.

The workshops offer opportunities to meet other CMP users and discuss CMP related topics with experts. Short contributions or longer presentations cover new developments in equipment, materials, processes, applications, etc. or inform about CMP-related subjects like measurement, cleaning, media distribution, waste disposal, etc.. Those interested in giving contributions are requested to contact the organizers. Submissions are considered in the order of arrival.

Wet chemical processes like wet etching, wet cleaning and electroplating furtheron play an important role in the manufacturing of microelectronic and MEMS devices. Due to the large overlap with CMP, it has been decided to hold meetings of the Wet Users Group in a tight connection to the CMP Users Meetings. Therefore, invitations to both meetings will be sent out together and future CMP Users Meetings will be introduced by a Wet Users Meeting the day before.

Recent presentations can be downloaded password-protected by the workshop attendees.

CMP Events

International Conference on Planarization/CMP Technology ICPT

ICPT is an annual high-level conference covering all aspects of CMP and has been founded by a co-operation of the CMP Users Groups of China, Europe, Japan, Korea, Taiwan and the United States. The very successful conference takes place generally in fall at changing locations: in Tokyo, Japan (2004), Seoul, South Korea (2005, 2011, 2018), Foster City, CA, USA (2006), Dresden, Germany (2007), Hsinchu, Taiwan (2008, 2013), Fukuoka (2009), Japan, Phoenix, Arizona, USA (2010), Grenoble, France (2012), Kobe, Japan (2014), Chandler, AZ, USA (2015), Beijing, China (2016) and Leuven, Belgium (2017). ICPT 2019 was held on September 16 - September 18, 2019 in Hsinchu, Taiwan.