Fraunhofer Institute for Silicon Technology
Fraunhofer Institute for Silicon Technology

Chemical-mechanical Polishing (CMP)

Announcements:

Next Meetings:

- CMP and WET Users' Group Meeting 12/2021

Next CMP and Wet Usergroup Meeting will be held online on Monday, December 13, and Tuesday, December 14, 2021.

Due to the still lasting restrictions caused by COVID-19 we have decided to organise another virtual Users Meeting with some “hybrid-light” components.

We are planning to hold the WET and CMP Users Meeting on December 13-14, 2021. Please save the date and submit contributions (author(s), title, 10 or 20 min) as soon as possible. Depending on the number of proposals the meeting might be held on one or two days. We would have to make the decision early enough to be able to plan the event.

Hybrid-light means that the organisers and session chairs will meet at Fraunhofer ISIT in Itzehoe. Additionally, those of you who will hold a presentation are also invited to come to the Northern Germany to join us.
In order to be able to participate, one must meet the conditions given by the Corona-related rules of the institute: You have to be fully-vaccinated or recovered from Covid-19. Negative COVID-test certificate is not sufficient.

Of course you can also give your talk online from your computer if you are not able to come to Itzehoe, although we would be very glad to welcome at least some of you personally!

All other participants can follow the Users Meeting online like the last meeting in April. We are sorry that the situation still does not allow a face-to-face meeting with all of you who are eager to meet other colleagues and friends to exchange news, discuss problems or just have a coffee together. We hope that situation eases and we can offer a live meeting next spring.

More information will follow as soon as we have a better overview and can prepare an agenda.

Sponsors who want to support us are very welcome.

For further information please contact benjamin.steible@isit.fraunhofer.de or knut.gottfried@enas.fraunhofer.de.

Download the presentations of the last meeting (April 2021) here:

CMP & WET Users' Meetings

© Fraunhofer ISIT/Eric Shambroom Photography 2020
© Fraunhofer ISIT/Eric Shambroom Photography 2020

The German VDE/VDI-GMM Society for Microelectronics, Micro and Precision Engineering supports developments in microelectronics and microsystem technology and organizes together with ISIT regular CMP users meetings. Target groups are all individuals who employ CMP and use it for production, who manufacture equipment and materials for CMP or who are active in CMP-related R&D.

Since 1998 the CMP Users Meetings are held in regular intervals. The fall meetings are organized in timely connection with Semicon Europa and have developed into an international event. The spring meetings take place at changing locations and are intended as a European forum for CMP information exchange.The conference language of the meeting is English.

The workshops offer opportunities to meet other CMP users and discuss CMP related topics with experts. Short contributions or longer presentations cover new developments in equipment, materials, processes, applications, etc. or inform about CMP-related subjects like measurement, cleaning, media distribution, waste disposal, etc.. Those interested in giving contributions are requested to contact the organizers. Submissions are considered in the order of arrival.

Wet chemical processes like wet etching, wet cleaning and electroplating furtheron play an important role in the manufacturing of microelectronic and MEMS devices. Due to the large overlap with CMP, it has been decided to hold meetings of the Wet Users Group in a tight connection to the CMP Users Meetings. Therefore, invitations to both meetings will be sent out together and future CMP Users Meetings will be introduced by a Wet Users Meeting the day before.

Recent presentations can be downloaded password-protected by the workshop attendees.

CMP Events

International Conference on Planarization/CMP Technology ICPT

ICPT is an annual high-level conference covering all aspects of CMP and has been founded by a co-operation of the CMP Users Groups of China, Europe, Japan, Korea, Taiwan and the United States. The very successful conference takes place generally in fall at changing locations: in Tokyo, Japan (2004), Seoul, South Korea (2005, 2011, 2018), Foster City, CA, USA (2006), Dresden, Germany (2007), Hsinchu, Taiwan (2008, 2013), Fukuoka (2009), Japan, Phoenix, Arizona, USA (2010), Grenoble, France (2012), Kobe, Japan (2014), Chandler, AZ, USA (2015), Beijing, China (2016) and Leuven, Belgium (2017). ICPT 2019 was held on September 16 - September 18, 2019 in Hsinchu, Taiwan.